RESIST PEELING APPARATUS

PROBLEM TO BE SOLVED: To provide a resist peeling apparatus that can remove resist fragments peeled from a substrate without changing process conditions. SOLUTION: This is an apparatus after a paste film on a substrate is patterned by sand blasting via a mask of a prescribed pattern consisting of a...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NISHIMURA SUKEYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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