RESIST PEELING APPARATUS

PROBLEM TO BE SOLVED: To provide a resist peeling apparatus that can remove resist fragments peeled from a substrate without changing process conditions. SOLUTION: This is an apparatus after a paste film on a substrate is patterned by sand blasting via a mask of a prescribed pattern consisting of a resist film, removing the resist film used as a mask in the sand blasting. A plurality of shower pipes P having downward nozzles N provided at a predetermined interval are arranged in parallel to the conveying direction of the substrates, and the direction of the nozzles N of each shower pipe P is changed to a state inclined from the vertical direction. Since a peeling liquid flows toward the edge of the substrate G and a cluster of the peeled resist fragments are pushed out of the substrate, the resist fragments peeled off the substrate can be made not to remain on the substrate without changing process conditions.