POLYMER AND METHOD OF MANUFACTURING THE SAME, AND COMPOSITION FOR FILM FORMING INCLUDING THE SAME

PROBLEM TO BE SOLVED: To provide a composition for film forming capable of baking in a short time, imparting a film having low dielectric constant excellent in heat resistance, adhesivity and resistance to cracking and a polymer and a method of manufacturing for the composition. SOLUTION: This polym...

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Hauptverfasser: YAMADA KINJI, NISHIKAWA MICHINORI, SHINOHARA NOBUYASU, OKADA TAKASHI, EBISAWA MASAHIKO, SHIRATO KAORI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a composition for film forming capable of baking in a short time, imparting a film having low dielectric constant excellent in heat resistance, adhesivity and resistance to cracking and a polymer and a method of manufacturing for the composition. SOLUTION: This polymer having a specific structure is obtained by reacting a specific dihalogen compound (e.g. 4,4'-bis(2-iodophenoxy) benzophenone) and a specific diethynyl compound (e.g. 4,4'-diethynyl diphenylether) in the presence of a catalyst. The composition for the film forming is obtained by dissolving the polymer in a solvent.