RESIST PEELING DEVICE

PROBLEM TO BE SOLVED: To provide a resist peeling device which can effectively peel off not only a resist film on a rib, but also a solid resist film for terminal protection, etc., without changing the process conditions. SOLUTION: This peeling device patterns a paste film on a substrate through san...

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Bibliographische Detailangaben
1. Verfasser:	NISHIMURA SUKEYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GRINDING HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a resist peeling device which can effectively peel off not only a resist film on a rib, but also a solid resist film for terminal protection, etc., without changing the process conditions. SOLUTION: This peeling device patterns a paste film on a substrate through sand blast processing using a mask formed of a resist film in specific pattern, and then removes the resist film used as the mask for the sand blade processing; and a dedicated nozzle Na is installed behind nozzles N for peeling the resist film off the substrate G so that only the solid resist film C on the substrate G is sprayed. Under the same process conditions, not only the resist film on the rib, but also the solid resist film C are effectively peeled off and then pushed out of the substrate G without damaging the rib pattern.