POLYCYCLIC COMPOUND HAVING LACTONE STRUCTURE

PROBLEM TO BE SOLVED: To provide a monomer which gives a polymer suitable as a base resin of a resist material used in photolithography using excimer laser light as a light source. SOLUTION: This monomer is a polycyclic compound represented by formula (1) or (2) (wherein R and R are each H or an alk...

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Bibliographische Detailangaben
Hauptverfasser:	NAITO TAKETOSHI, OKAGO YUJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a monomer which gives a polymer suitable as a base resin of a resist material used in photolithography using excimer laser light as a light source. SOLUTION: This monomer is a polycyclic compound represented by formula (1) or (2) (wherein R and R are each H or an alkyl or alkoxycarbonyl group; R and R are each H or an alkyl group; and X is a methylene or ethylene group, O or S).