APPARATUS AND METHOD FOR FORMING FILM ON LARGE-SCALE SUBSTRATE

PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a film on a large- scale substrate with plasma CVD, which can accurately form a film having a uniform thickness and quality, by detecting factors directly correlating with distribution of plasma as a distribution on or around a p...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIDA SEIICHI, KUBOTA TAKAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a film on a large- scale substrate with plasma CVD, which can accurately form a film having a uniform thickness and quality, by detecting factors directly correlating with distribution of plasma as a distribution on or around a plane of a substrate, and controlling the distribution of plasma into the optimum condition, on the basis of the information on the distribution. SOLUTION: This apparatus comprises a sealed housing which introduces high-frequency current fractionated by a high-frequency current fractionation means, through a high-frequency current fractionation point set on at least one of electrodes or the current feeding point, and converts high-frequency current into light by a photovoltaic device, an optical fiber cable which takes out optical signals from the sealed housing and leads them to an optical signal processing device, and the optical signal processing device which outputs plasma distribution signals of generated plasma according to the optical signals, to make the plasma distribution signals as the information for uniformizing the distribution of generated plasma.