EQUIPMENT FOR EVALUATING POLYSILICON FILM

PROBLEM TO BE SOLVED: To provide an equipment for evaluating the state of a formed polysilicon film objectively and automatically with high accuracy without touching the film. SOLUTION: The equipment 1 for evaluating the state of a polysilicon film formed by annealing an amorphous silicon film compr...

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Hauptverfasser:	EBE MASATAKA, ABE TETSUO, NOGUCHI YOSHIYUKI, OOSHIMA AKIFUMI, ISOMURA EIJI, ISHIGURO TOMOHIRO, KATO YASUYUKI, TAMAOKI HIROYUKI, TATSUKI KOICHI, UMETSU NOBUHIKO, WADA HIROYUKI, HATTORI TADASHI, URAGAKI MAKOTO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an equipment for evaluating the state of a formed polysilicon film objectively and automatically with high accuracy without touching the film. SOLUTION: The equipment 1 for evaluating the state of a polysilicon film formed by annealing an amorphous silicon film comprises a visible light observation optical system 4 for picking up the surface image of a polysilicon film formed on a substrate W by irradiating the substrate W on a stage with visible light and auto-focusing the surface image, and an UV-ray observation optical system 6 irradiating UV-rays. From the surface image of the polysilicon film obtained by the UV-ray observation optical system, linearity and periodicity of spatial structure on the surface of the polysilicon film are evaluated and the state thereof is evaluated based on the evaluation results.