METHOD FOR CREATING WRITING DATA FOR ELECTRON BEAM EXPOSURE AND ELECTRON BEAM WRITING, AND METHOD FOR MANUFACTURING PHOTO MASK, X-RAY MASK, AND MASK FOR CHARGED BEAM PROJECTION ALIGNING

PROBLEM TO BE SOLVED: To provide a method for creating writing data for electron beam exposure and electron beam writing, and a method for manufacturing a photo mask, an X-ray mask, and a mask for charged beam projection aligning for creating a mask pattern exactly same as a designed value with an existing low accelerating voltage electron beam writing system by a variable shaped method. SOLUTION: The electron beam writing by the variable shaped method comprises steps for: creating an address by dividing all pattern areas for electron beam writing into a grid enough smaller than a minimum mask pattern size; obtaining energy storage distribution data in a resist every each address in the all pattern areas based on the superposition of an energy storage distribution function f (r), and the position coordinate data of the mask pattern; grading them in accordance with the relative value of the energy storage among every mesh split pattern; obtaining an offset value of an electron beam dose in accordance with ranks given in each mesh division pattern; and compensating the electron beam dose.