REFRACTORY AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a refractory at a low cost having a thermal resistance >=1,100 deg.C, high alkali resistance and high mechanical strength and its manufacturing method. SOLUTION: The refractory comprises α-silicon carbide, α-silicon nitride, β-silicon nitride, and silicon oxynitri...

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Bibliographische Detailangaben
Hauptverfasser: HARA TOMOHIKO, ITO YASUO, IRIMURA JUNICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a refractory at a low cost having a thermal resistance >=1,100 deg.C, high alkali resistance and high mechanical strength and its manufacturing method. SOLUTION: The refractory comprises α-silicon carbide, α-silicon nitride, β-silicon nitride, and silicon oxynitride and substantially does not contain cristobalite. Preferably, it comprises 60-85 wt.% α-silicon carbide and 15-40 wt.% total of α-silicon nitride, β-silicon nitride and silicon oxynitride. The refractory is manufactured by forming a compact comprising 65.0-85.0 wt.% silicon carbide powder, 10.5-33.5 wt.% silicon powder, and 1.5-4.5 wt.% microsilica powder and firing it in an nitrogen atmosphere.