SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING

PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTI...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NARA HIDEYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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