SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING

PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTI...

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Bibliographische Detailangaben
1. Verfasser: NARA HIDEYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTION: This device has a light shading film defect information database which stores light shading film defect information on each light shading film- formed substrate, a light shading film defect registration part which registers light shading film defect information in the light shading film defect information database, a drawing information database which stores drawing information on a pattern to be drawn, a drawing information registration part which registers the drawing information on the pattern to be drawn in the drawing information database, and a light shading film-formed substrate selection part which selects a shading film-formed substrate applicable to the target product by one or more means from the drawing information and light shading film information stored in each database; and the light shading film-formed substrate selection part selects the light shading film-formed substrate applied to the target product.