SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING
PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTI...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTION: This device has a light shading film defect information database which stores light shading film defect information on each light shading film- formed substrate, a light shading film defect registration part which registers light shading film defect information in the light shading film defect information database, a drawing information database which stores drawing information on a pattern to be drawn, a drawing information registration part which registers the drawing information on the pattern to be drawn in the drawing information database, and a light shading film-formed substrate selection part which selects a shading film-formed substrate applicable to the target product by one or more means from the drawing information and light shading film information stored in each database; and the light shading film-formed substrate selection part selects the light shading film-formed substrate applied to the target product. |
---|