SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING

PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTI...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: NARA HIDEYUKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator NARA HIDEYUKI
description PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTION: This device has a light shading film defect information database which stores light shading film defect information on each light shading film- formed substrate, a light shading film defect registration part which registers light shading film defect information in the light shading film defect information database, a drawing information database which stores drawing information on a pattern to be drawn, a drawing information registration part which registers the drawing information on the pattern to be drawn in the drawing information database, and a light shading film-formed substrate selection part which selects a shading film-formed substrate applicable to the target product by one or more means from the drawing information and light shading film information stored in each database; and the light shading film-formed substrate selection part selects the light shading film-formed substrate applied to the target product.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2002278046A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2002278046A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2002278046A3</originalsourceid><addsrcrecordid>eNrjZHALDnUKDglyDHFVCHb1cXUO8fRzV3BxDfN0dlVw9HNRCA4NCPCJVPB1DfHwd1Fw8w9SQGgA8VyCHMOBWngYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBgZGRuYWBiZmjMVGKABtpLOI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING</title><source>esp@cenet</source><creator>NARA HIDEYUKI</creator><creatorcontrib>NARA HIDEYUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTION: This device has a light shading film defect information database which stores light shading film defect information on each light shading film- formed substrate, a light shading film defect registration part which registers light shading film defect information in the light shading film defect information database, a drawing information database which stores drawing information on a pattern to be drawn, a drawing information registration part which registers the drawing information on the pattern to be drawn in the drawing information database, and a light shading film-formed substrate selection part which selects a shading film-formed substrate applicable to the target product by one or more means from the drawing information and light shading film information stored in each database; and the light shading film-formed substrate selection part selects the light shading film-formed substrate applied to the target product.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20020927&amp;DB=EPODOC&amp;CC=JP&amp;NR=2002278046A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20020927&amp;DB=EPODOC&amp;CC=JP&amp;NR=2002278046A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NARA HIDEYUKI</creatorcontrib><title>SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING</title><description>PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTION: This device has a light shading film defect information database which stores light shading film defect information on each light shading film- formed substrate, a light shading film defect registration part which registers light shading film defect information in the light shading film defect information database, a drawing information database which stores drawing information on a pattern to be drawn, a drawing information registration part which registers the drawing information on the pattern to be drawn in the drawing information database, and a light shading film-formed substrate selection part which selects a shading film-formed substrate applicable to the target product by one or more means from the drawing information and light shading film information stored in each database; and the light shading film-formed substrate selection part selects the light shading film-formed substrate applied to the target product.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHALDnUKDglyDHFVCHb1cXUO8fRzV3BxDfN0dlVw9HNRCA4NCPCJVPB1DfHwd1Fw8w9SQGgA8VyCHMOBWngYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBgZGRuYWBiZmjMVGKABtpLOI</recordid><startdate>20020927</startdate><enddate>20020927</enddate><creator>NARA HIDEYUKI</creator><scope>EVB</scope></search><sort><creationdate>20020927</creationdate><title>SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING</title><author>NARA HIDEYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2002278046A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>NARA HIDEYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NARA HIDEYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING</title><date>2002-09-27</date><risdate>2002</risdate><abstract>PROBLEM TO BE SOLVED: To provide a substrate selecting device which is used for pattern drawing for photomask production, can supply a substrate meeting quality specifications of a target product, does not waste a photosensitive material, and is satisfactory in terms of cost and productivity. SOLUTION: This device has a light shading film defect information database which stores light shading film defect information on each light shading film- formed substrate, a light shading film defect registration part which registers light shading film defect information in the light shading film defect information database, a drawing information database which stores drawing information on a pattern to be drawn, a drawing information registration part which registers the drawing information on the pattern to be drawn in the drawing information database, and a light shading film-formed substrate selection part which selects a shading film-formed substrate applicable to the target product by one or more means from the drawing information and light shading film information stored in each database; and the light shading film-formed substrate selection part selects the light shading film-formed substrate applied to the target product.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2002278046A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title SUBSTRATE SELECTING DEVICE AND SUPPLY METHOD FOR SUBSTRATE FOR DRAWING
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T19%3A12%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NARA%20HIDEYUKI&rft.date=2002-09-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2002278046A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true