COMPOSITION FOR ORGANIC ANTIREFLECTION FILM AND ITS PRODUCTION METHOD

PROBLEM TO BE SOLVED: To provide a novel polymer for antireflection film, a composition containing the polymer; and a semiconductor element produced by using the composition. SOLUTION: A polymer represented by formula (1) (wherein Ra and Rb are each H or methyl; R' and R" are each-H,-OH,-O...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG JAEANG, JUNG MIN-HO, SHIN KI-SOO, JUN SUU RII
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a novel polymer for antireflection film, a composition containing the polymer; and a semiconductor element produced by using the composition. SOLUTION: A polymer represented by formula (1) (wherein Ra and Rb are each H or methyl; R' and R" are each-H,-OH,-OCOCH3 ,-COOH,-CH2 OH, or a 1-6C optionally substituted linear or branched alkyl or alkoxyalkyl group; n is an integer of 1-5; and x and y are each a mol fraction of 0.01-0.99) and a polymer represented by formula (2) (wherein R10 and R11 are each a 1-10C alkoxyalkyl group substituted by a linear or branched chain; and R12 is H or methyl) are provided. The composition for antireflection film contains either of a polymer represented by formula (1) and a polymer represented by formula (2).