METHOD OF PRODUCING CERIUM OXIDE POLISHING MATERIAL AND CERIUM OXIDE POLISHING MATERIAL PRODUCED BY THE METHOD

PROBLEM TO BE SOLVED: To provide the technology that can efficiently produce cerium oxide polishing material with markedly reduced content of coarse grains causing polishing flaws and provide a cerium oxide polishing material that can polish glass surfaces with polishing flaws reduced extremely. SOL...

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Hauptverfasser: YAMAZAKI HIDEHIKO, UCHINO YOSHIJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide the technology that can efficiently produce cerium oxide polishing material with markedly reduced content of coarse grains causing polishing flaws and provide a cerium oxide polishing material that can polish glass surfaces with polishing flaws reduced extremely. SOLUTION: The raw material of the rare earth mixture including cerium is finely crushed to prepare a raw material for polishing material. The material is fired, cracked and classified to produce the objective cerium polishing material wherein the rare earth mixture is pulverized until the content of the coarse grains with the particle size of >=10 μm is reduced to