OPTICAL ELEMENT DEFORMATION SYSTEM, SPECIFIC DEFORMATION SYSTEM FOR OPTICAL ELEMENT, AND SPECIFIC DEFORMATION METHOD OF OPTICAL ELEMENT

PROBLEM TO BE SOLVED: To remove an image error of an optical element in the projection lens, and to actively adjust the image error. SOLUTION: In a specific deformation system of the optical element in the projection exposure machine especially having the projection lens of the micro- lithography us...

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Hauptverfasser: GELLRICH BERNHARD, MELZER FRANK, XALTER STEFAN, ITTNER THOMAS, SORG FRANZ, MUHLBEYER MICHAEL
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creator GELLRICH BERNHARD
MELZER FRANK
XALTER STEFAN
ITTNER THOMAS
SORG FRANZ
MUHLBEYER MICHAEL
description PROBLEM TO BE SOLVED: To remove an image error of an optical element in the projection lens, and to actively adjust the image error. SOLUTION: In a specific deformation system of the optical element in the projection exposure machine especially having the projection lens of the micro- lithography use in the imaging apparatus for removing the image error or actively adjusting the image error, a piezoelectric element 3 is adhered to or integrated into the surface to be deformed as an actuator of the thin plate, thin film, or thin layer. By combining with an adaptronic servo loop having a sensor 4, and controlling the operation of the piezoelectric element 3 as an actuator, a force and/or a moment are added to the optical element, and the optical element is specified and deformed.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title OPTICAL ELEMENT DEFORMATION SYSTEM, SPECIFIC DEFORMATION SYSTEM FOR OPTICAL ELEMENT, AND SPECIFIC DEFORMATION METHOD OF OPTICAL ELEMENT
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