OPTICAL ELEMENT DEFORMATION SYSTEM, SPECIFIC DEFORMATION SYSTEM FOR OPTICAL ELEMENT, AND SPECIFIC DEFORMATION METHOD OF OPTICAL ELEMENT

PROBLEM TO BE SOLVED: To remove an image error of an optical element in the projection lens, and to actively adjust the image error. SOLUTION: In a specific deformation system of the optical element in the projection exposure machine especially having the projection lens of the micro- lithography us...

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Bibliographische Detailangaben
Hauptverfasser:	GELLRICH BERNHARD, MELZER FRANK, XALTER STEFAN, ITTNER THOMAS, SORG FRANZ, MUHLBEYER MICHAEL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To remove an image error of an optical element in the projection lens, and to actively adjust the image error. SOLUTION: In a specific deformation system of the optical element in the projection exposure machine especially having the projection lens of the micro- lithography use in the imaging apparatus for removing the image error or actively adjusting the image error, a piezoelectric element 3 is adhered to or integrated into the surface to be deformed as an actuator of the thin plate, thin film, or thin layer. By combining with an adaptronic servo loop having a sensor 4, and controlling the operation of the piezoelectric element 3 as an actuator, a force and/or a moment are added to the optical element, and the optical element is specified and deformed.