DEVICE AND METHOD FOR CLEANING TREATMENT

PROBLEM TO BE SOLVED: To contrive enhancement of the yield of a product by preventing a different atmosphere from being brought in the following process in the case of using a cleaning liquid of a different kind. SOLUTION: The device for cleaning treatment is equipped with spin chucks 50 rotatably holding a semiconductor wafer 1, a first cleaning treatment part 25 having a first cleaning liquid supply means supplying prescribed cleaning liquid to the wafer 1, a second cleaning treatment part 26 having a cleaning liquid supply nozzle supplying cleaning liquid of the atmosphere different from the cleaning liquid used in the first cleaning treatment part 25 to the spin chucks 50 and the wafer 1 and a carrier means 23 carrying the wafer 1 to a prescribed position and delivering the wafer 1 between the spin chucks 50. The first cleaning treatment part 25 and the second cleaning treatment part 26 are separated and arranged by a carrier path 22 of the carrier means 23. Thereby, invasion of a different atmospheric component in the respective cleaning treatment processes can be surely arrested and therefore prevention of contamination of the wafer 1 by cleaning liquid of the different atmosphere is contrived and also enhancement of the yield of a product can be contrived.