STRUCTURE WITH TAPERED LANDING AND METHOD OF FABRICATION

PROBLEM TO BE SOLVED: To provide a multilayer structure including a substrate, a member formed over the substrate and a connecting element. SOLUTION: The member 68 is regarded as taper landing. A surface portion 76 extends from a thick portion and terminates at a thin portion to form a taper landing...

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Bibliographische Detailangaben
Hauptverfasser: MERCHANT SAILESH MANSINH, EDWARD BELDEN HARRIS, DOWNEY STEPHEN WARD
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a multilayer structure including a substrate, a member formed over the substrate and a connecting element. SOLUTION: The member 68 is regarded as taper landing. A surface portion 76 extends from a thick portion and terminates at a thin portion to form a taper landing surface. The taper landing surface 76 extends from the upper surface 78 of a silicon nitride layer 38 over the thick portion 72 and the thick portion 72. The taper landing surface 76 has a variable slope rising from the surface 78. The variable slope is characterized by an average angle θdetermining the height between a part 80 on the surface 78, i.e., the end of the taper landing, and a part 82 of maximum thickness. Slope of the surface 76 with respect to the silicon nitrogen surface 78 has effect on the fact whether the surface 76 can function as a landing region suitable for contact with an element formed anew.