METHOD FOR ETCHING INSULATING FILM AND METHOD FOR MANUFACTURING INSULATING FILM LAMINATE STRUCTURE

METHOD FOR ETCHING INSULATING FILM AND METHOD FOR MANUFACTURING INSULATING FILM LAMINATE STRUCTURE

PROBLEM TO BE SOLVED: To enable prevention of decrease in insulating performance by etching an insulating film. SOLUTION: A method for etching the insulating film 3, arranged in a laminated state between conductor films 1 and 2, comprises a step of partly etching the film 3 to a position on the way...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YAMAUCHI HIDEAKI, KAWASE YOHEI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To enable prevention of decrease in insulating performance by etching an insulating film. SOLUTION: A method for etching the insulating film 3, arranged in a laminated state between conductor films 1 and 2, comprises a step of partly etching the film 3 to a position on the way of a thickness direction, a step of executing a masking 5 on a side face 3a of the partly etched film 3, and a step of etching the residual film 3.