COMPOSITION FOR ORGANIC ANTI-REFLECTIVE FILM AND METHOD FOR PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide an organic anti-reflective film which uses a specific polymer in a process for forming superfine patterns, can form the stable superfine patters, while removing the changes in standing waves and reflection due to the changes of the optical properties and photoresist...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG JAEANG, HONG SUNG-EUN, JUNG MIN-HO, BAIK KI-HO, JUN SUU RII
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an organic anti-reflective film which uses a specific polymer in a process for forming superfine patterns, can form the stable superfine patters, while removing the changes in standing waves and reflection due to the changes of the optical properties and photoresist thickness of a lower film layer on a wafer and the change in CD due to the lower film, and further can freely adjust the k value of the organic anti-reflective film as well as increase the yield of the product. SOLUTION: The organic anti-reflective polymer characterized by having a structure of the chemical formula [1]. The method for producing the polymer. The anti-reflective film composition containing the organic anti-reflective polymer, and the method for producing the anti-reflective film with the composition.