METHOD FOR REMOVING SILANE

PROBLEM TO BE SOLVED: To provide a method for efficiently removing a silane from a silane- containing gas with a simple-structured apparatus by using a basic water solution containing no heavy metal nor organic solvent. SOLUTION: In a method for absorbing and removing a silane by bringing a silane-c...

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Hauptverfasser:	KANBARA YOSHIHIKO, UTSUNOMIYA ATSUSHI, ASAO KOICHI, YAMAMOTO AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for efficiently removing a silane from a silane- containing gas with a simple-structured apparatus by using a basic water solution containing no heavy metal nor organic solvent. SOLUTION: In a method for absorbing and removing a silane by bringing a silane-containing gas into contact with a basic water solution in a bubble tower, a gas-liquid two-phase stream comprising the silane-containing gas and the basic water solution in introduced into the tower through a nozzle placed at the lower part of the tower.