ANTIREFLECTIVE COATING ORGANIC COMPOSITION AND METHOD FOR PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide an antireflective coating organic composition enabling a specified polymer to form for an antireflective film in a hyperfine pattern- forming process and capable of forming the stable hyperfine pattern in a high yield, by preventing reflection of the light by an inne...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG JAEANG, HONG SUNG-EUN, JUNG MIN-HO, BAIK KI-HO, JUN SUU RII
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an antireflective coating organic composition enabling a specified polymer to form for an antireflective film in a hyperfine pattern- forming process and capable of forming the stable hyperfine pattern in a high yield, by preventing reflection of the light by an inner film layer on a wafer, by removing standing waves caused by unevenness in thickness of a photoresist and by removing critical dimensional(CD) fluctuation caused by the diffracted or reflected light, and to provide a method for producing the antireflective film capable of freely controlling a k-value which is difficult to be controlled in conventional films. SOLUTION: This antireflective coating composition contains the organic antireflective polymer which is given by using a compound expressed by the general formula (1) (R is H or methyl; Ra, Rb and R1 to R9 are each -H, -OH, -OCOCH3, -COOH, -CH2OH, -H, a 1-5C linear or branched alkyl which may be substituted or not substituted, a 1-5C linear or branched alkoxyalkyl which may be substituted or not substituted; and n is 1-5). The method for producing the antireflective film comprises utilizing the antireflective coating composition.