ORGANIC ANTI-REFLECTIVE FILM COMPOSITION AND METHOD FOR PRODUCING THE SAME
PROBLEM TO BE SOLVED: To prepare an anti-reflective film which uses a specific polymer in a process for forming ultra fine patterns, eliminates standing waves caused by the optical properties of lower layers on a wafer and by the thickness changes of a photoresist, prevents back reflection and CD al...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To prepare an anti-reflective film which uses a specific polymer in a process for forming ultra fine patterns, eliminates standing waves caused by the optical properties of lower layers on a wafer and by the thickness changes of a photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers, enables the formation of stable ultra fine patterns, can improve the production yields, and can freely control k values different from reflection preventing films. SOLUTION: A compound having the basic structure of the following chemical formula is provided. An organic anti-reflective polymer having the following chemical formula 1 is obtained by using the compound. A method for synthesizing the organic anti-reflective polymer is provided. The anti-reflective film composition containing the organic anti-reflective polymer is obtained. The method for producing the anti-reflective film from the anti-reflective film composition is also provided. |
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