METHOD OF BUILDING SUB-RESOLUTION ASSIST FEATURE TO PHOTOMASK LAYOUT

PROBLEM TO BE SOLVED: To provide a method of forming photomask layouts for forming images of electric circuits. SOLUTION: This method includes a step of building a sub-resolution assist feature into the photomask layout. This step is executed by (1) a step of classifying the selection details of the...

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Bibliographische Detailangaben
Hauptverfasser:	SCOTT M MANSFIELD, LAAS W LIEBMANN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of forming photomask layouts for forming images of electric circuits. SOLUTION: This method includes a step of building a sub-resolution assist feature into the photomask layout. This step is executed by (1) a step of classifying the selection details of the main electric circuits to be subjected to image improvement in accordance with the sequence of the prescribed importance of the image improvement of the selection details of the main electric circuits viewed from the entire part performance of the main electric circuits, (2) a step of establishing the priority sequence of the sub-resolution assist feature associated with the selection details of the main electric circuits in accordance with the sequence of the prescribed importance of the selection details of the main electric circuits associated with the sub-resolution assist feature and (3) a step of building the sub-resolution assist feature into the photomask layout in accordance with the established priority sequence of the sub-resolution assist feature.