POLISHING APPARATUS

PROBLEM TO BE SOLVED: To provide a polishing apparatus capable of preventing leakage of a polishing liquid or its mist. SOLUTION: A shutoff portion (e.g. cover member 7) for preventing the polishing liquid scattered within a polishing chamber 6 and a mist of the polishing liquid floating in the poli...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MIYAMOTO TAKEMI, IWABUCHI SHOZO
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polishing apparatus capable of preventing leakage of a polishing liquid or its mist. SOLUTION: A shutoff portion (e.g. cover member 7) for preventing the polishing liquid scattered within a polishing chamber 6 and a mist of the polishing liquid floating in the polishing chamber from leaking out of the upper portion (opening 61) of the polishing chamber 6 without impeding reciprocation of the rotating shaft 41 of a polishing brush 4 or the like in B direction in the figure and its movement in A direction in the figure is provided at the upper portion of the polishing chamber 6.