METHOD FOR MANUFACTURING TITANIUM OXIDE SINGLE CRYSTAL THIN FILM OF ANATASE-TYPE CRYSTAL STRUCTURE
PROBLEM TO BE SOLVED: To reduce the crystal defect, etc. in a thin film of titanium dioxide by forming the structure of the thin film into single crystal and to improve characteristics such as photocatalytic reaction efficiency, that is, to improve the efficiency of reaction where the decomposition...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To reduce the crystal defect, etc. in a thin film of titanium dioxide by forming the structure of the thin film into single crystal and to improve characteristics such as photocatalytic reaction efficiency, that is, to improve the efficiency of reaction where the decomposition and removal of harmful gas such as nitrogen oxides are performed by using the single crystal thin film as a photocatalyst, in a method for manufacturing a titanium dioxide single crystal thin film of anatase-type crystal structure. SOLUTION: There is provided a method for manufacturing the titanium dioxide (TiO2) single crystal thin film having anatase-type crystal structure on a single crystal substrate of lanthanum aluminate (LaAlO3), magnesium oxide (MgO), stabilized zirconia (YSZ) or LSAT([LaAlO3]0.3)-([SrAl0.5Ta0.5O3]0.7) by a laser ablation film deposition method. Moreover, substrate temperature for depositing the titanium dioxide single crystal thin film of anatase-type crystal structure is controlled to 360-520 deg.C, and also oxygen gas pressure is controlled to 10-100 mTorr. |
---|