MANUFACTURING METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT MANUFACTURED BY THE SAME

PROBLEM TO BE SOLVED: To provide a semiconductor integrated circuit, capable of suppressing size of transistor small by only changing a mask after operational check of a prototype. SOLUTION: The prototypic semiconductor integrated circuit is manufactured and checked, by forming impurity diffusion re...

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Bibliographische Detailangaben

1. Verfasser:	ONO YOSHITERU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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