NEW CYCLOPENTENONE COMPOUND AND METHOD FOR PRODUCING THE SAME

NEW CYCLOPENTENONE COMPOUND AND METHOD FOR PRODUCING THE SAME

PROBLEM TO BE SOLVED: To provide a cyclopentenone compound which is an important intermediate for the production of polymers used for photoresists in photolithography process for processing of semiconductors. SOLUTION: This cyclopentenone compound represented by the general formula (1) (R1 and R2 ar...

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Bibliographische Detailangaben
Hauptverfasser: MORIZAKI YASUHIRO, KOTO TAKEAKI, KONDO TERUYUKI
Format: Patent
Sprache:eng
Schlagworte:
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS THEREFOR
CHEMISTRY
GENERAL METHODS OF ORGANIC CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a cyclopentenone compound which is an important intermediate for the production of polymers used for photoresists in photolithography process for processing of semiconductors. SOLUTION: This cyclopentenone compound represented by the general formula (1) (R1 and R2 are each independently H or a 1 to 5C alkyl; R3 is H or a 1 to 4C alkyl), and a method for producing the same.