HYDROGEN PEROXIDE DECOMPOSING METHOD FOR CHEMICAL POLISHING WASTE LIQUID

PROBLEM TO BE SOLVED: To provide a hydrogen peroxide decomposing method excellent in operability and environmental protection for a chemical polishing liquid containing hydrogen peroxide. SOLUTION: Metal vanadium or a vanadium compound is added into the chemical polishing waste liquid containing hyd...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAHASHI KENICHI, MORIYAMA KENICHI, KOGURE NAOKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a hydrogen peroxide decomposing method excellent in operability and environmental protection for a chemical polishing liquid containing hydrogen peroxide. SOLUTION: Metal vanadium or a vanadium compound is added into the chemical polishing waste liquid containing hydrogen peroxide.