LASER DISCHARGE CHAMBER PASSIVATION BY PLASMA
PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn int...
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| creator | QUITTER JOHN P SANDSTROM RICHARD L LEWIS MARK R WEEKS ROBERT E WATSON TOM A MORTON RICHARD G |
| description | PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn into a laser discharge chamber, reacts with a contaminant, and cleans the internal surface. After cleaning, fluorine-based plasma is formed at the plasma source, and is drawn into the laser discharge chamber to passivate the inner surface. In another embodiment, the oxygen-based plasma and fluorine-based plasma are formed in the laser discharge chamber by applying a high-frequency signal to a laser discharge chamber electrode, thus exciting the gas containing oxygen and that containing fluorine. |
| format | Patent |
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SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn into a laser discharge chamber, reacts with a contaminant, and cleans the internal surface. After cleaning, fluorine-based plasma is formed at the plasma source, and is drawn into the laser discharge chamber to passivate the inner surface. In another embodiment, the oxygen-based plasma and fluorine-based plasma are formed in the laser discharge chamber by applying a high-frequency signal to a laser discharge chamber electrode, thus exciting the gas containing oxygen and that containing fluorine.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; CLEANING ; CLEANING IN GENERAL ; DEVICES USING STIMULATED EMISSION ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20011226&DB=EPODOC&CC=JP&NR=2001358386A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20011226&DB=EPODOC&CC=JP&NR=2001358386A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>QUITTER JOHN P</creatorcontrib><creatorcontrib>SANDSTROM RICHARD L</creatorcontrib><creatorcontrib>LEWIS MARK R</creatorcontrib><creatorcontrib>WEEKS ROBERT E</creatorcontrib><creatorcontrib>WATSON TOM A</creatorcontrib><creatorcontrib>MORTON RICHARD G</creatorcontrib><title>LASER DISCHARGE CHAMBER PASSIVATION BY PLASMA</title><description>PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn into a laser discharge chamber, reacts with a contaminant, and cleans the internal surface. After cleaning, fluorine-based plasma is formed at the plasma source, and is drawn into the laser discharge chamber to passivate the inner surface. In another embodiment, the oxygen-based plasma and fluorine-based plasma are formed in the laser discharge chamber by applying a high-frequency signal to a laser discharge chamber electrode, thus exciting the gas containing oxygen and that containing fluorine.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND1cQx2DVJw8Qx29nAMcndVAFK-TkCRAMfgYM8wxxBPfz8Fp0iFAKA6X0ceBta0xJziVF4ozc2g5OYa4uyhm1qQH59aXJCYnJqXWhLvFWBkYGBobGphbGHmaEyUIgD32iXN</recordid><startdate>20011226</startdate><enddate>20011226</enddate><creator>QUITTER JOHN P</creator><creator>SANDSTROM RICHARD L</creator><creator>LEWIS MARK R</creator><creator>WEEKS ROBERT E</creator><creator>WATSON TOM A</creator><creator>MORTON RICHARD G</creator><scope>EVB</scope></search><sort><creationdate>20011226</creationdate><title>LASER DISCHARGE CHAMBER PASSIVATION BY PLASMA</title><author>QUITTER JOHN P ; SANDSTROM RICHARD L ; LEWIS MARK R ; WEEKS ROBERT E ; WATSON TOM A ; MORTON RICHARD G</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2001358386A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2001</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>QUITTER JOHN P</creatorcontrib><creatorcontrib>SANDSTROM RICHARD L</creatorcontrib><creatorcontrib>LEWIS MARK R</creatorcontrib><creatorcontrib>WEEKS ROBERT E</creatorcontrib><creatorcontrib>WATSON TOM A</creatorcontrib><creatorcontrib>MORTON RICHARD G</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>QUITTER JOHN P</au><au>SANDSTROM RICHARD L</au><au>LEWIS MARK R</au><au>WEEKS ROBERT E</au><au>WATSON TOM A</au><au>MORTON RICHARD G</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LASER DISCHARGE CHAMBER PASSIVATION BY PLASMA</title><date>2001-12-26</date><risdate>2001</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn into a laser discharge chamber, reacts with a contaminant, and cleans the internal surface. After cleaning, fluorine-based plasma is formed at the plasma source, and is drawn into the laser discharge chamber to passivate the inner surface. In another embodiment, the oxygen-based plasma and fluorine-based plasma are formed in the laser discharge chamber by applying a high-frequency signal to a laser discharge chamber electrode, thus exciting the gas containing oxygen and that containing fluorine.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLEANING CLEANING IN GENERAL DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING |
| title | LASER DISCHARGE CHAMBER PASSIVATION BY PLASMA |
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