LASER DISCHARGE CHAMBER PASSIVATION BY PLASMA

PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn int...

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Bibliographische Detailangaben
Hauptverfasser:	QUITTER JOHN P, SANDSTROM RICHARD L, LEWIS MARK R, WEEKS ROBERT E, WATSON TOM A, MORTON RICHARD G
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLEANING CLEANING IN GENERAL DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method and device for cleaning and passivating a laser discharge chamber by plasma. SOLUTION: Oxygen-based plasma is formed at an external plasma source by guiding and applying a high-frequency signal to a gas containing oxygen. The oxygen-based plasma is drawn into a laser discharge chamber, reacts with a contaminant, and cleans the internal surface. After cleaning, fluorine-based plasma is formed at the plasma source, and is drawn into the laser discharge chamber to passivate the inner surface. In another embodiment, the oxygen-based plasma and fluorine-based plasma are formed in the laser discharge chamber by applying a high-frequency signal to a laser discharge chamber electrode, thus exciting the gas containing oxygen and that containing fluorine.