METHOD FOR FORMING ALIGNMENT FEATURE IN MULTILAYER SEMICONDUCTOR STRUCTURE OR ON MULTILAYER SEMICONDUCTOR STRUCTURE

PROBLEM TO BE SOLVED: To provide a method capable of using by forming an alignment feature in a multilayer semiconductor structure or on the multilayer semiconductor structure and connecting the feature to an SCALPEL tool. SOLUTION: A method for forming a multilayer semiconductor structure has the a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DAVID MAKUERUROI BOURIN, NEISU RAYADI, FARROW REGINALD CONWAY, KIZILYALLI ISIK C, MKRTCHYAN MASIS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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