SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of decreasing footprint and increasing the number of units. SOLUTION: The substrate processing apparatus comprises a plurality of rotation system units 19, 30, and 31 for processing the substrate by rotating them, a plurality...

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Bibliographische Detailangaben
1. Verfasser:	TATEYAMA KIYOHISA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HANDLING THIN OR FILAMENTARY MATERIAL HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PACKING PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of decreasing footprint and increasing the number of units. SOLUTION: The substrate processing apparatus comprises a plurality of rotation system units 19, 30, and 31 for processing the substrate by rotating them, a plurality of thermal system units 20 to 21 and 32 to 34 for heating and cooling the substrate in failures of rotation of them, and transfer paths 16 and 24 for forming the transferring paths of the transfer devices 15 and 25 for transferring the substrate in and out of the unit, wherein the rotation system units 19, 30, and 31 are lined along the transfer paths 16 and 24, the thermal system units 20 to 23 and 32 to 34 are arranged in multiply piled up state and arranged so as to surround a point on the transfer paths 16 and 24 or their extension line.