DEVICE FOR INSPECTING DOSE UNIFORMITY IN ION IMPLANTATION

PROBLEM TO BE SOLVED: To provide a device for confirming dose uniformity in ion implantation, capable of accurately measuring the dose with simple constitution. SOLUTION: This device is provided with an aperture plate 2 irradiated with ion beams from an ion beam irradiator 5; a Faraday cup 4 dispose...

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Bibliographische Detailangaben
Hauptverfasser:	TAKESHITA MASAYOSHI, YASAKA MITSUO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a device for confirming dose uniformity in ion implantation, capable of accurately measuring the dose with simple constitution. SOLUTION: This device is provided with an aperture plate 2 irradiated with ion beams from an ion beam irradiator 5; a Faraday cup 4 disposed behind a hole 3 opened in the aperture plate 2, to detect a beam current generated by an ion beam incident through the hole 3; and an arithmetic circuit 10 connected to the Faraday cup 4 to measure the dose which is a total charge quantity. The arithmetic circuit is provided with a first integrator 12 and a second integrator 13 for integrating the beam current I flowing from the detector 4; a switching circuit 11 for alternately switching the first integrator 12 and the second integrator 13; and a computer 22 for computing the sum of the integrated values of the first integrator 12 and second integrator 13.