ANTIMICROBIAL IMPRESSION MATERIAL AND PHOTOIRRADIATION DEVICE

PROBLEM TO BE SOLVED: To provide an antimicrobial impression material which enables the degradative extinction and breeding inhibition of viruses, fungi, bacteria and the like, without using anantimicrobial agent and without giving loads to human bodies and environments. SOLUTION: This antimicrobial...

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Bibliographische Detailangaben
Hauptverfasser: NAKAMURA HAJIME, KATO SHINJI, KUROBE HISATOKU, KATO DAISUKE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an antimicrobial impression material which enables the degradative extinction and breeding inhibition of viruses, fungi, bacteria and the like, without using anantimicrobial agent and without giving loads to human bodies and environments. SOLUTION: This antimicrobial impression material is characterized by adding and mixing titanium dioxide with a dental impression material. The titanium dioxide is preferably anatase type, rutile type or their mixture. A silicone impression material, a polysulfide impression material, a polyether rubber impression material, an alginate impression material, an agar impression material or a modeling compound impression material is used as the antimicrobial impression material.