HOLD CASSETTE, HOLD HAND, WET PROCESSING METHOD AND WET PROCESSOR

PROBLEM TO BE SOLVED: To provide a wet processor improved so as to suppress dust from being produced from a wafer due to mechanical damages, wear, etc. SOLUTION: The wet processor slantwise tilts guide grooves 112a, 112b formed into a cassette 302 to slantwise hold a substrate 1 under processing. Th...

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Bibliographische Detailangaben
1. Verfasser: FUJINO NAOHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a wet processor improved so as to suppress dust from being produced from a wafer due to mechanical damages, wear, etc. SOLUTION: The wet processor slantwise tilts guide grooves 112a, 112b formed into a cassette 302 to slantwise hold a substrate 1 under processing. The substrate 1 is supported at the side faces of the guide grooves 112a, 112b, so that the load is linearly or plainly dispersed to relax the mechanical damage to the substrate 1. It is held slantwise to lower the supporting height of the substrate 1 and thus the height of the wet processor can be lowered.