METHOD AND DEVICE FOR REFORMING ENERGY BEAM

METHOD AND DEVICE FOR REFORMING ENERGY BEAM

PROBLEM TO BE SOLVED: To prevent damage caused by applying laser beams to a part being different from a substrate in a method and device for applying the laser beams to the substrate that is represented by amorphous silicon for reforming the substrate. SOLUTION: In a beam shield 8, an opening is for...

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Bibliographische Detailangaben
Hauptverfasser: NAKAJIMA HIDEHARU, NOGUCHI TAKASHI, USUI SETSUO, JINBO MASAO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent damage caused by applying laser beams to a part being different from a substrate in a method and device for applying the laser beams to the substrate that is represented by amorphous silicon for reforming the substrate. SOLUTION: In a beam shield 8, an opening is formed corresponding to an amorphous silicon thin film 5 that covers a stage 7 and is formed on the surface of a glass substrate 6 that is placed on the stage 7. The beam shield 8 moves in linking with the stage 7. By the beam shield 8, a laser beam 2 is made simply to irradiate the amorphous silicon thin film 5, thus preventing the stage 7 from being exposed to the laser beam 2.