CLEANING EQUIPMENT

PROBLEM TO BE SOLVED: To provide cleaning equipment which can prevent static charging of pure water for rinsing injected into a cleaning tank, and eliminate recontamination and pattern damages which are caused by sticking particles. SOLUTION: In this cleaning equipment, a semiconductor device such as a silicon wafer 5 is dipped in pure water injected into a cleaning tank 1, and the device surface is cleaned with the pure water. The cleaning tank 1 and a hose for injecting the pure water into the tank are constituted of an electrical insulator. The hose 2 is covered with an electrostatic shield cover 7 composed of a conductive material, and the cover 7 is grounded. At the same time or individually, the pure water in the tank 1 is grounded via an electrode 8.