PLASMA ENHANCED CVD SYSTEM FOR LARGE-DIAMETER CARBON NANOTUBE THIN FILM DEPOSITION, AND METHOD OF DEPOSITION FOR THE THIN FILM

PROBLEM TO BE SOLVED: To provide a CVD system for large-diameter carbon nanotube thin film deposition, requiring no much labor having high production capacity of carbon nanotube and low electric power consumption and reduced in manufacturing cost, and a method of deposition for the thin film. SOLUTI...

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Hauptverfasser:	AGAWA YOSHIAKI, MURAKAMI HIROHIKO, TAKAHASHI SHOJIRO, YAMAMOTO YOSHIHIRO, YAMAGUCHI KOICHI, HIRAKAWA MASAAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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