PLASMA ENHANCED CVD SYSTEM FOR LARGE-DIAMETER CARBON NANOTUBE THIN FILM DEPOSITION, AND METHOD OF DEPOSITION FOR THE THIN FILM

PROBLEM TO BE SOLVED: To provide a CVD system for large-diameter carbon nanotube thin film deposition, requiring no much labor having high production capacity of carbon nanotube and low electric power consumption and reduced in manufacturing cost, and a method of deposition for the thin film. SOLUTION: In the CVD system for carbon nanotube thin film deposition by means of microwave plasma enhanced chemical vapor deposition, a plurality of microwave generation systems are arranged in a row and the cavities of the systems are arranged right above the upper lid of the deposition chamber. A plurality of slits are provided to the bottoms of the cavities of the microwave generation systems and the microwave is passed through these slit and introduced into the deposition chamber via the quartz upper lid right under the cavities. The carbon nanotube thin film can be deposited by using this system.