EXPOSURE EQUIPMENT

PROBLEM TO BE SOLVED: To provide exposure equipment that has an attitude control means to correct the deviation of transferred image caused by attitude fluctuations of an optical member of an optical image formation system of the equipment. SOLUTION: The exposure equipment always monitors at least t...

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Bibliographische Detailangaben
Hauptverfasser:	SHINKAI HIROSHI, SHIMEKI KOUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide exposure equipment that has an attitude control means to correct the deviation of transferred image caused by attitude fluctuations of an optical member of an optical image formation system of the equipment. SOLUTION: The exposure equipment always monitors at least the attitude of one optical member such as a trapezoidal mirror 1 that is susceptible to the attitude change caused by an external impact and a scanner's vibration with helps of the attitude sensors 20l, 20r, 21u, and 21d. The equipment computes an instruction value that improves an accuracy of transfer by a processor 30 that gets data from each sensor. The equipment compensates a displacement of the transfer registration on the plate stage 9 by feeding the compensation value of the plate 6 that complies with the instruction value while the exposure is implemented to the plate stage driving mechanism (a Y axis fine tuning mechanism 12 of the plate stage, a driving motor 22 for rotary mechanism and the like).