POLLUTION ELIMINATING UNIT FOR EXHAUST GAS FROM SEMICONDUCTOR PROCESS

PROBLEM TO BE SOLVED: To provide a pollution eliminating unit having a high pollution eliminating ratio with, such as PFC. SOLUTION: An exhaust inlet 5 introducing the exhaust discharged from a semiconductor producing equipment at the upper part of a vertically extended outer cylinder 1. The lower edge part of the outer cylinder 1 is opened to the air and an air flow path is formed between the inner surface of the outer cylinder 1 and the outer surface of an inner cylinder 2 by inserting the inner cylinder 2 of which upper edge part is opened into the outer cylinder 1 through the lower edge opening of the outer cylinder 1. The lower part of the inner cylinder 2 communicates with a suction unit. At the position of the outer cylinder 1 upper of the upper edge part opening of the inner cylinder 2 and lower than gas introducing holes 5 and 6, gas fuel combustion burners 9 are arranged in a plurality of steps vertically. A combustion zone 10 of burner flames is formed inside the outer cylinder 1 by arranging the direction of burner jets inclining with the plane crossing the axis of the centerline of the cylinder body.