PHOTORESIST STRIPPER COMPOSITION AND PHOTORESIST STRIPPING METHOD USING THE SAME

PROBLEM TO BE SOLVED: To provide a photoresist stripper composition which is capable of effectively and quickly strip the photoresist applied to a substrate from the substrate regardless of its kinds and polarity, and a photoresist stripping method. SOLUTION: The photoresist stripper composition con...

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Hauptverfasser:	MOON SANG SIK, JEON MI-SOOK, PARK JE UENG, JUN PIL KWON, GIL JUNE, CHON SANG-MOON
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY CLEANING CLEANING IN GENERAL DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photoresist stripper composition which is capable of effectively and quickly strip the photoresist applied to a substrate from the substrate regardless of its kinds and polarity, and a photoresist stripping method. SOLUTION: The photoresist stripper composition consists of a mixture composed of acetone, γ-butyrolactone and ester solvent. While the substrate is rotated at a relatively low speed, the photoresist stripper composition is injected onto the substrate and the photoresist stripper composition is further injected onto the substrate by increasing the rotating speed. After the substrate is rinsed with pure water, the photoresist on the wafer is completely removed. Accordingly, only the rinsing stage using pure water suffices without going through a rinsing step using an organic solvent. The number of stages may therefore be decreased as compared with the conventional stripping method.