VERTICAL HEAT TREATMENT EQUIPMENT AND HEAT TREATMENT METHOD

PROBLEM TO BE SOLVED: To enable vertical heat treatment equipment, which performs heat treatment on semiconductor wafers by carrying the wafers in a reaction chamber from the downside while the wafers are held in a shelf-like state by means of a holder to stabilize the temperature in its treatment atmosphere in a short time and to widen the uniform temperature zone in the treatment atmosphere. SOLUTION: This vertical heat treatment equipment is constitute, in such a way that heat insulating units are provided between a lid body which closes the lower end of a reaction vessel and the holder and heating element units, each of which is constituted by enclosing a resistance heat generating wire made of, for example, a high-purity carbon material in a quartz plate are provided on, for example, the top faces of the heat insulating units. Then, for example, quartz blocks are provided on the downsides the heating element units. The heat-insulating units are fixed to the lid body, and a rotating shaft which rotates the holder is passed through the central parts of the heat insulating units, so that feeding path members for feeding electricity to the heating element units is facilitated to be drawn out easily.