POLYMER FOR MANICURE AND COMPOSITION FOR MANICURE USING THE SAME

PROBLEM TO BE SOLVED: To provide a polymer for a manicure excellent in adhesion and durability of a film when used as a manicure. SOLUTION: This polymer for a manicure comprises 0.5-90 wt.% of a constituting unit derived from a polysiloxane compound bearing a radically polymerizable unsaturated bond...

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Hauptverfasser: KAWAGUCHI SHIGEOKI, HIWATARI TOMOAKI, SAITO YUKIO, HAYAMA KAZUHIDE, ITO YOSHIYO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a polymer for a manicure excellent in adhesion and durability of a film when used as a manicure. SOLUTION: This polymer for a manicure comprises 0.5-90 wt.% of a constituting unit derived from a polysiloxane compound bearing a radically polymerizable unsaturated bond on both ends of a molecular chain and 10-99.5 wt.% of a constituting unit derived from a radically polymerizable monomer copolymerizable therewith, and has a weight-average mol.wt. of 30,000-1,500,000.