SINGLE-ELECTRON TRANSISTOR AND MANUFACTURING METHOD THEREFOR

PROBLEM TO BE SOLVED: To provide a method for manufacturing a single-electron transistor that is operated at a room temperature and has a simple manufacturing process. SOLUTION: In the method for manufacturing a single-electron transistor, a surface oxide layer 3 between a source electrode 4 and a d...

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Bibliographische Detailangaben
Hauptverfasser: INOUE ATSUHISA, FUJIOKA KAZUSHI, ONO KIMITAKA
Format: Patent
Sprache:eng
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