POSITIVE PHOTORESIST COMPOSITION

PROBLEM TO BE SOLVED: To obtain a positive photoresist composition excellent in exposure speed, the rate of a residual film, etc., and capable of improving the work environment because a slight offensive odor is emitted. SOLUTION: The positive photoresist composition contains a polymer resin for for...

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Bibliographische Detailangaben
Hauptverfasser:	BOKU KOSHOKU, SHU SHINGO, RI YUKYO, RA JUSEI, KYO SEITETSU, KIN KISHU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a positive photoresist composition excellent in exposure speed, the rate of a residual film, etc., and capable of improving the work environment because a slight offensive odor is emitted. SOLUTION: The positive photoresist composition contains a polymer resin for forming a photoresist film, a photosensitive compound which varies the solubility of the photoresist film by exposure and 3-methoxybutyl acetate, 2- heptanone and 4-butyrolactone as solvents.