ANTIREFLECTION FILM AND ITS PRODUCTION METHOD

PROBLEM TO BE SOLVED: To provide a method for producing an antireflection film that reduces the surface reflection of reflected light of a display device, is less liable to contamination and has an antistatic effect and an electromagnetic wave and IR shielding effect. SOLUTION: The antireflection fi...

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Bibliographische Detailangaben
1. Verfasser:	YUASA MOTOKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PERFORMING OPERATIONS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for producing an antireflection film that reduces the surface reflection of reflected light of a display device, is less liable to contamination and has an antistatic effect and an electromagnetic wave and IR shielding effect. SOLUTION: The antireflection film has fluorinated alkyl-containing silica laminated on at least one face of a substrate film by way of a metal-containing thin film layer. The antireflection film is produced by utilizing discharge plasma generated by applying a pulsated electric field between opposite electrodes in a gaseous atmosphere containing a metallic compound and a gas containing an alkylsilane and fluorine under a pressure close to atmospheric pressure.