SUBSTRATE SUPPORTING DEVICE AND SUBSTRATE TRANSFER MECHANISM

PROBLEM TO BE SOLVED: To support a substrate with certainty by providing a shock absorbing mechanism for a substrate supporting device. SOLUTION: The substrate supporting device is obtained by providing a shock absorbing mechanism at a substrate holding part of a substrate supporting device for supp...

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Bibliographische Detailangaben
Hauptverfasser:	IMAI HIROYUKI, ARIGA YOSHIKI, HASEGAWA YOSHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To support a substrate with certainty by providing a shock absorbing mechanism for a substrate supporting device. SOLUTION: The substrate supporting device is obtained by providing a shock absorbing mechanism at a substrate holding part of a substrate supporting device for supporting, in a vertical posture, a discoid substrate having a center hole at the center.