POLYAMIDE HAVING SIDE CHAIN OF ACETAL OR CYCLIC DERIVATIVE THEREOF AND HEAT-RESISTANT PHOTORESIST COMPOSITION PREPARED FROM THE SAME

PROBLEM TO BE SOLVED: To prevent increase in the dielectric constant due to residual hydroxyl groups and to retain high heat resistance by providing a side chain of a specified acetal or its cyclic derivative. SOLUTION: A polyamide has a side chain of an acetal of formula I or its cyclic derivatives...

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Hauptverfasser: PAKU DON-WON, WON JON CHAN, CHOI KIRU-YON, WOO SAN SUN, JIN MUUN YAN, OO JAE MIN, RII MUU YAN, KIM TAE-KYUN
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent increase in the dielectric constant due to residual hydroxyl groups and to retain high heat resistance by providing a side chain of a specified acetal or its cyclic derivative. SOLUTION: A polyamide has a side chain of an acetal of formula I or its cyclic derivatives. In the formula I, Ar1 is a tetravalent aromatic group, Ar2 is a divalent aromatic group R1, and R2 are the same or different and are each H or a 1-10C linear, branched or cyclic hydrocarbon ester, specifically, however excluding a group of formula II, however, excluding the case where R1 and R2 are simultaneously H. The range for m+n is from 5 to 500. In the formula II, R' is a 1-6C lower alkyl, e.g. ethyl, propyl or isopropyl. The polyamide having formula I as a repeating unit is a home- or copolymer from the combination of Ar1 and Ar2.